Origin of the orientation ratio in sputtered longitudinal media

Journal of Applied Physics

Volumn 93, Issue 10 2, 2003, Pages 7393-7395

  Demczyk, B G ^a   Zhou, J N ^a   Choe, G ^a   Stach, E ^b   Nelson, E C ^b   Dahmen, U ^b  

^a MAXTOR CORPORATION   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; EPITAXIAL GROWTH; FREE ENERGY; MAGNETIC ANISOTROPY; SPUTTERING; SURFACE ROUGHNESS; TEXTURES; TRANSMISSION ELECTRON MICROSCOPY;

SPUTTERED LONGITUDINAL MEDIA;

MAGNETIC RECORDING;

EID: 0037975573     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1558236     Document Type: Conference Paper

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