Alignment and switching behaviors of liquid crystal on a-Si Ox thin films deposited by a filtered cathodic arc process

Applied Physics Letters

Volumn 91, Issue 6, 2007, Pages

  Martin, P J ^a   Bendavid, A ^a   Comte, C ^a   Miyata, H ^b   Asao, Y ^b   Ishida, Y ^b   Sakai, A ^b  

^a CSIRO   (Australia)

^b CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GEOMETRY; OPTICAL SWITCHES; SILICON COMPOUNDS; SURFACE ROUGHNESS; THIN FILMS;

CATHODIC ARC PROCESS; PRETILT ANGLE; REACTIVE FILTERED; SILICON OXIDE LAYERS;

LIQUID CRYSTALS;

EID: 34547850659     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2768308     Document Type: Article

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