Influence of substrate orientation on low-temperature epitaxial growth of ferromagnetic silicide Fe3Si on Si

Thin Solid Films

Volumn 515, Issue 22, 2007, Pages 8250-8253

  Ueda, Koji ^a   Kizuka, Ryo ^a   Takeuchi, Hisashi ^a   Kenjo, Atsushi ^a   Sadoh, Taizoh ^a   Miyao, Masanobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Fe3Si; Ferromagnetic silicide; Heterostructure; Molecular beam epitaxy

Indexed keywords

EPITAXIAL GROWTH; IRON ALLOYS; METALLIC FILMS; SILICIDES; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

FERROMAGNETIC SILICIDE; TRANSMISSION ELECTRON MICROSCOPY (TEM) MEASUREMENTS;

FERROMAGNETIC MATERIALS;

EID: 34547818075     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.052     Document Type: Article

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