Epitaxial growth of ferromagnetic silicide Fe3Si on Si(111) substrate

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 4 B, 2006, Pages 3598-3600

  Sadoh, Taizoh ^a   Takeuchl, Hisashi ^a   Ueda, Koji ^a   Kenjo, Atsushi ^a   Miyao, Masanobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Fe3Si; Ferromagnetic suicide; Heterostructure; Molecular beam epitaxy; Spin transistor

Indexed keywords

EPITAXIAL GROWTH; HETEROJUNCTIONS; MAGNETIC ANISOTROPY; MAGNETOMETERS; MOLECULAR BEAM EPITAXY; SILICON;

FERROMAGNETIC SILICIDE (FE3SI); IN-PLANE MAGNETIC ANISOTROPY; RANDOM POLYCRYSTAL; SPIN TRANSISTOR;

FERROMAGNETIC MATERIALS;

EID: 33646917747     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.3598     Document Type: Article

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