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Volumn 579, Issue 2 SPEC. ISS., 2007, Pages 706-711

Evaluation of OKI SOI technology

Author keywords

CMOS; FET; Radiation damage; SOI

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC UTILITIES; FABRICATION; FIELD EFFECT TRANSISTORS; RADIATION DAMAGE; SEMICONDUCTOR JUNCTIONS;

EID: 34547753560     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2007.05.272     Document Type: Article
Times cited : (16)

References (7)
  • 1
    • 34547789328 scopus 로고    scopus 로고
    • Y. Arai, et al., Monolithic pixel detector in a 0.15 μm FD-SOI technology, presented in this conference, SLAC-PUB-12079 〈http://rd.kek.jp/project/soi/〉.
  • 2
    • 34547770332 scopus 로고    scopus 로고
    • 〈http://www.oki.com〉, 〈http://www.oki.com/en/otr/196/downloads/otr-196-R15.pdf〉.
  • 5
    • 34547748969 scopus 로고    scopus 로고
    • CERN Council Resolution, The European Strategy for Particle Physics, 14 July 2006.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.