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Volumn 579, Issue 2 SPEC. ISS., 2007, Pages 706-711
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Evaluation of OKI SOI technology
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Author keywords
CMOS; FET; Radiation damage; SOI
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
ELECTRIC UTILITIES;
FABRICATION;
FIELD EFFECT TRANSISTORS;
RADIATION DAMAGE;
SEMICONDUCTOR JUNCTIONS;
JUNCTION CAPACITANCE;
OKI ELECTRIC INDUSTRY CO. (CO);
TEST ELEMENT GROUP (TEG) STRUCTURES;
SILICON ON INSULATOR TECHNOLOGY;
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EID: 34547753560
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nima.2007.05.272 Document Type: Article |
Times cited : (16)
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References (7)
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