Chemical analysis of acidic silicon etch solutions. I. Titrimetric determination of HNO3, HF, and H2SiF6

Talanta

Volumn 73, Issue 2, 2007, Pages 220-226

  Henßge, Antje ^a,c   Acker, Jörg ^b,c  

^a UNIVERSITY OF APPLIED SCIENCES DRESDEN   (Germany)

^b Lausitz University of Applied Sciences   (Germany)

^c IFW DRESDEN   (Germany)

Author keywords

H2SiF6; HF HNO3 Etch solution; Ion selective electrode; Non aqueous titrant; Potentiometric titration; Silicon

Indexed keywords

MICROELECTRONICS; PHOTOVOLTAIC EFFECTS; SILICON COMPOUNDS; SILICON WAFERS;

ION-SELECTIVE ELECTRODE; NON-AQUEOUS TITRANT; PHOTOVOLTAIC APPLICATIONS; POTENTIOMETRIC TITRATION;

ETCHING;

EID: 34547747286     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2007.02.004     Document Type: Article

References (8)

1. Robbins H., and Schwartz B. J. Electrochem. Soc. 106 (1959) 505-508
2. Steinert M., Acker J., Henßge A., and Wetzig K. J. Electrochem. Soc. 152 (2005) C843-C850
3. DeWolf S., Choulat P., Vazsonyi E., Einhaus R., van Kerschaver E., DeClercq K., and Szlufcik J. Proceedings of the 16th EC PVSEC. Glasgow (2000) 1521-1523
4. W. Weinreich, Diploma Thesis, Freiberg University of Mining and Technology, Freiberg, Germany, 2005.
5. Röver I., Wambach K., Weinreich W., Roewer G., and Bohmhammel K. Proceedings of the 20th EU-PVSEC. Barcelona (2005) 899-902
6. W. Weinreich, J. Acker, I. Gräber, submitted for publication.
7. Henßge A., Acker J., and Müller C. Talanta 68 (2006) 581-585
8. Gyenes I. Titration in Non-aqueous Media (1967), Akademiai Kiado, Budapest