Titrimetric determination of silicon dissolved in concentrated HF-HNO 3-etching solutions

Talanta

Volumn 68, Issue 3, 2006, Pages 581-585

  Henßge, Antje ^a   Acker, Jörg ^a   Müller, Constanze ^a  

^a IFW DRESDEN   (Germany)

Author keywords

H2SiF6; HF HNO3 etching mixtures; Isotropic etching; Potentiometric titration; Silicon

Indexed keywords

BINARY MIXTURES; DISSOLUTION; ETCHING; HYDROLYSIS; NITRIC ACID; SOLUTIONS; TITRATION;

H2SIF6; HF-HNO3-ETCHING MIXTURES; ISOTROPIC ETCHING; POTENTIOMETRIC TITRATION;

SILICON WAFERS;

EID: 30144431825     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2005.04.049     Document Type: Article

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