Submicron dry-etching behavior of β-FeSi2 thin films towards fabrication of photonic crystals

Thin Solid Films

Volumn 515, Issue 22, 2007, Pages 8162-8165

  Imai, A ^a   Kunimatsu, S ^a   Akiyama, K ^b   Terai, Y ^c   Maeda, Y ^a  

^a KYOTO UNIVERSITY   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

FeSi2; High refractive contrast; NLD RIE; Photonic crystal

Indexed keywords

EPITAXIAL GROWTH; ETCHING; ION BEAM ASSISTED DEPOSITION; IRON COMPOUNDS; PHOTONIC CRYSTALS; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION;

HIGH REFRACTIVE CONTRASTS; NEUTRAL LOOP DISCHARGE (NLD); POLYCRYSTALLINE FILMS;

THIN FILMS;

EID: 34547731880     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.032     Document Type: Article

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