CO+NH3 plasma etching for magnetic thin films

Journal of Magnetism and Magnetic Materials

Volumn 272-276, Issue SUPPL. 1, 2004, Pages

  Kubota, Hitoshi ^a   Ueda, Kousei ^a   Ando, Yasuo ^a   Miyazaki, Terunobu ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Appearance mass spectroscopy; CO; Etching rate; Magnetic thin film; NH3; Reactive ion etching

Indexed keywords

CARBON MONOXIDE; CURRENT DENSITY; ELECTRON CYCLOTRON RESONANCE; MASS SPECTROMETERS; PLASMA ETCHING; PLASMA SOURCES; REACTIVE ION ETCHING;

APPEARANCE MASS SPECTROSCOPY; BIAS POWER DENSITY; ETCHING RATES; NH3;

MAGNETIC THIN FILMS;

EID: 23144439108     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.12.724     Document Type: Conference Paper

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