Chlorinated silicon carbide CVD revisited for polycrystalline bulk growth

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 8888-8892

  Chichignoud, G ^a   Ucar Morais, M ^b   Pons, M ^a   Blanquet, E ^a  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^b SAVOIE TECHNOLAC   (France)

Author keywords

Film morphology; Silicon carbide; Supersaturation; Thermodynamic and thermal modelling; Wafer bonding

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GROWTH RATE; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; SUPERSATURATION; SYNTHESIS (CHEMICAL); WAFER BONDING;

GAS PHASE COMPOSITION; METHYLTRICHLOROSILANE; PHYSICAL VAPOUR TRANSPORT;

SILICON CARBIDE;

CHEMICAL VAPOR DEPOSITION; GROWTH RATE; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; SILICON CARBIDE; SUPERSATURATION; SYNTHESIS (CHEMICAL); WAFER BONDING;

EID: 34547727742     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.113     Document Type: Article

References (17)

1. Di Cioccio L., Le-Tiec Y., Letertre F., and Jaussaud C. Electron. Lett. 32 12 (1996) 1144
2. Chichignoud G., Pons M., Blanquet E., Chaussende D., Anikin M., Pernot E., Mermoux M., Madar R., Moisson C., and Letertre F. Surf. Coat. Technol. 201 7 (2006) 4014
3. Tairov Yu.M., and Tsetkov V.F. J. Cryst. Growth, 43 (1978) 209
4. Chaussende D., Baillet F., Charpentier L., Pernot E., Pons M., and Madar R. J. Electrochem. Soc. 150 10 (2003) G653-G657
5. Monnoye S., Turover D., and Vicente P. In: Pensl G. (Ed). Silicon Carbide: Recent Major Advances (2004) 699-710
6. CFD-ACE+, CFD Research Corporation 215 Wynn Drive Huntsville (Alabama), USA.
7. Kleijn C.R. In: Meyyappan M. (Ed). Chemical Vapor Deposition Processes. Computational Modeling in Semiconductor Processing (1995), Artech House, Boston 97 (Chapter 4)
8. SGTE: http://www.sgte.org.
9. Allendorf M.D., and Melius C.F. J. Phys. Chem. 97 3 (1993) 720
10. Rocabois P., Chatillon C., and Bernard C. High Temp. High Press. 27/28 1 (1996) 3
11. Rocabois P., Chatillon C., Bernard C., and Genet F. High Temp. High Press. 27/28 1 (1996) 25
12. FactSage: www.factsage.com.
13. La Via F., Galvagno G., Foti G., Mauceri M., Leone S., Pistone G., Abbondanza G., Veneroni A., Masi M., Valente G.L., and Crippa D. Chem. Vapor Depos. 12 8-9 (2006) 509
14. Blocher J.M. J. Vac. Sci. Technol. 11 4 (1974) 680
15. Räback P., Nieminen R., Yakimova R., Tuominen M., and Janzén E. J. Electrochem. Soc. 144 (1997) 1024
16. Chin J., Gantzel P.K., and Hudson R.G. Thin Solid Films 40 (1977) 57
17. Kajikawa Y., Noda S., and Komiyama H. Chem. Vapor Depos. 8 3 (2002) 99