The microstructure and cathodoluminescence characteristics of sputtered Zn2SiO4:Ti phosphor thin films

Thin Solid Films

Volumn 515, Issue 20-21, 2007, Pages 7994-7999

  Lin, C M ^a   Tsai, Y Z ^b   Chen, J S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b CHENG SHIU UNIVERSITY   (Taiwan)

Author keywords

Zn2SiO4; Absorption; XPS; XRD

Indexed keywords

ABSORPTION; CATHODOLUMINESCENCE; DOPING (ADDITIVES); MICROSTRUCTURE; PHOSPHORS; SPUTTERING; TITANIUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC COMPOUNDS;

ABSORPTION EDGES; EMISSION INTENSITY;

THIN FILMS;

EID: 34547693145     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.04.024     Document Type: Article

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