Small-angle reciprocal space mapping of surface relief gratings

Materials Science and Engineering C

Volumn 27, Issue 5-8 SPEC. ISS., 2007, Pages 1154-1157

  Birkholz, M ^a   Zaumseil, P ^a   Bauer, J ^a   Bolze, D ^a   Weidner, G ^a  

^a IHP   (Germany)

Author keywords

CMOS technology; Doping lattice; Nanopatterning; Reciprocal space mapping; Small angle X ray scattering; Surface relief gratings

Indexed keywords

ATOMIC FORCE MICROSCOPY; BIOMOLECULES; DIFFRACTION GRATINGS; DOPING (ADDITIVES); SILICON WAFERS; X RAY SCATTERING;

CMOS TECHNOLOGY; DOPING LATTICE; NANOPATTERNING; RECIPROCAL SPACE MAPPING; SURFACE RELIEF GRATINGS;

SURFACE TREATMENT;

EID: 34547662089     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2006.08.005     Document Type: Article

References (5)

1. Bauer J., Fursenko O., Virko S., Kuck B., Grabolla T., Melnik V., and Mehr W. In: Behringer U.F.W. (Ed). SPIE Proc. vol. 5835 (2005) 263
2. Bauer J., Haak U., Schulz K., Old G., and Kraft A. SPIE Proc. vol. 6152 (2006) 1209
3. Birkholz M. Thin Film Analysis by X-ray Scattering (2006), Wiley-VCH, Weinheim
4. Geue T., Henneberg O., and Pietsch U. Cryst. Res. Technol. 37 (2002) 770
5. Pietsch U. Phys. Rev., B 66 (2002) 155430