ALD growth of Ru on RIE-pretreated TaN substrate

ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings

Volumn , Issue , 2006, Pages 330-332

  Zhou, Mi ^a   Chen, Tao ^a   Tan, Jing Jing ^a   Zhao, Feng ^a   Ru, Guo Ping ^a   Li, Bingzong ^a   Qu, Xin Ping ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CHARACTERIZATION; FILM GROWTH; NUCLEATION; POLYCRYSTALLINE MATERIALS; REACTIVE ION ETCHING; TANTALUM COMPOUNDS;

PRECURSORS; PRETREATMENT; THERMAL ALD PROCESS;

SUBSTRATES;

EID: 34547368029     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSICT.2006.306220     Document Type: Conference Paper

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