Investigation of nanocrystal-(Ti,Al)Nx/ amorphous-SiNy composite films by co-deposition process

Surface and Coatings Technology

Volumn 177-178, Issue , 2004, Pages 209-214

  Yau, Bao Shun ^a   Huang, Jow Lay ^a   Lii, Ding Fwu ^b   Sajgalik, Pavol ^c  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b CHENG SHIU UNIVERSITY   (Taiwan)

^c INSTITUTE OF CHEMISTRY   (Slovakia)

Author keywords

(Ti,Al)Nx; Amorphous; Co deposition; Nanocrystal; SiNy

Indexed keywords

AMORPHOUS FILMS; COMPOSITE MATERIALS; CRYSTAL ORIENTATION; DEPOSITION; FILM PREPARATION; HARDNESS; RESIDUAL STRESSES;

CO-DEPOSITION PROCESS; COLUMNAR STRUCTURES;

NANOSTRUCTURED MATERIALS;

COATING;

EID: 1342331945     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.09.034     Document Type: Article

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