Fabrication of long-range surface plasmon-polariton waveguides in lithium niobate on silicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 692-700

  Mattiussi, Greg ^a,b   Lahoud, Nancy ^b   Charbonneau, Robert ^b,c   Berini, Pierre ^b,d  

^a Epocal Inc   (Canada)

^b Spectalis Corporation   (Canada)

^c DEFENCE RESEARCH AND DEVELOPMENT CANADA   (Canada)

^d UNIVERSITY OF OTTAWA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; GOLD; LITHIUM COMPOUNDS; SURFACE PLASMON RESONANCE; THIN FILMS;

LITHIUM NIOBATE WAFERS; LONG-RANGE SURFACE PLASMON-POLARITON WAVEGUIDES; QUALITY CLADDINGS;

WAVEGUIDES;

EID: 34547348161     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2740294     Document Type: Article

References (31)

1. H. Raether, Surface Plasmons on Smooth and Rough Surfaces and on Gratings (Springer, Berlin, 1988), Vol. 111.
2. W. L. Barnes, J. Opt. A, Pure Appl. Opt. 8, S87 (2006).
3. W. L. Barnes, A. Dereux, and T. W. Ebbesen, Nature (London) 424, 824 (2003).
4. S. A. Maier and H. A. Atwater, J. Appl. Phys. 98, 011101 (2005).
5. P. Berini, Phys. Rev. B 61, 10484 (2000).
6. P. Berini, Phys. Rev. B 63, 125417 (2001).
7. R. Charbonneau, P. Berini, E. Berolo, and E. Lisicka-Shrzek, Opt. Lett. 25, 844 (2000).
8. R. Nikolajsen, K. Leosson, I. Salakhutdinov, and S. I. Bozhevolnyi, Appl. Phys. Lett. 82, 668 (2003).
9. P. Berini, R. Charbonneau, N. Lahoud, and G. Mattiussi, J. Appl. Phys. 98, 043109 (2005).
10. R. Charbonneau, N. Lahoud, G. Mattiussi, and P. Berini, Opt. Express 13, 977 (2005).
11. A. Boltasseva, T. Nikolajsen, K. Leosson, K. Kjaer, M. S. Larsen, and S. I. Bozhevolnyi, J. Lightwave Technol. 23, 413 (2005).
12. R. Charbonneau, C. Scales, I. Breukelaar, S. Fafard, N. Lahoud, G. Mattiussi, and P. Berini, J. Lightwave Technol. 24, 477 (2006).
13. A. Degiron and D. R. Smith, Opt. Express 14, 1611 (2006).
14. S. Jett́-Charbonneau, R. Charbonneau, N. Lahoud, G. Mattiussi, and P. Berini, Opt. Express 13, 4674 (2005).
15. A. Boltasseva, S. I. Bozhevolnyi, T. Søndergaard, T. Nikolajsen, and K. Leosson, Opt. Express 13, 4237 (2005).
16. T. Nikolajsen, K. Leosson, and S. I. Bozhevolnyi, Appl. Phys. Lett. 85, 5833 (2004).
17. T. Nikolajsen, K. Leosson, and S. I. Bozhevolnyi, Opt. Commun. 244, 455 (2005).
18. G. Gagnon, N. Lahoud, G. Mattiussi, and P. Berini, J. Lightwave Technol. 24, 4391 (2006).
19. S. Park and S. H. Song, Electron. Lett. 42, 402 (2006).
20. J.-C. Weeber, J. R. Krenn, A. Dereux, B. Lamprecht, Y. Lacroute, and J.-P. Goudonnet, Phys. Rev. B 64, 045411 (2001).
21. B. Lamprecht, J. R. Krenn, G. Schider, H. Ditlbacher, M. Salerno, N. Felidj, A. Leitner, and F. R. Aussenegg, Appl. Phys. Lett. 79, 51 (2001).
22. Q.-Y. Tong and U. Gösele, Semiconductor Wafer Bonding: Science and Technology (Wiley Interscience, Toronto, 1999).
23. J. Haisma, B. A. C. M. Spierings, U. K. P. Biermann, and A. A. van Gorkum, Appl. Opt. 33, 1154 (1994).
24. Y. Tomita, M. Sugimoto, and K. Eda, Appl. Phys. Lett. 66, 1484 (1995).
25. S. McMeekin, R. M. De La Rue, and W. Johnstone, J. Lightwave Technol. 10, 163 (1992).
26. M. Levy, R. M. Osgood, Jr., R. Liu, L. E. Cross, G. S. Cargill III, A. Kumar, and H. Bakhru, Appl. Phys. Lett. 73, 2293 (1998).
27. T. A. Ramadan, M. Levy, and R. M. Osgood, Jr., Appl. Phys. Lett. 76, 1407 (2000).
28. P. Rabiei and P. Gunter, Appl. Phys. Lett. 85, 4603 (2004).
29. G. Mattiussi, N. Lahoud, R. Charbonneau, and P. Berini, Proc. SPIE 5720, 173 (2005).
30. P. Berini, G. Mattiussi, N. Lahoud, and R. Charbonneau, Proc. SPIE 6475, 6475oU (2007).
31. P. Berini, G. Mattiussi, N. Lahoud, and R. Charbonneau, Appl. Phys. Lett. 90, 061108 (2007).