Structural and gas-sensing properties of nanometre tin oxide prepared by PECVD

Journal of Materials Science: Materials in Electronics

Volumn 7, Issue 4, 1996, Pages 279-282

  Liu, Y ^a,b   Zhu, W ^a   Tan, O K ^a   Yao, X ^a   Shen, Y ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFERENTIAL THERMAL ANALYSIS; GAS ABSORPTION; INFRARED SPECTROSCOPY; OXIDES; PLASMA APPLICATIONS; POWDERS; THERMOGRAVIMETRIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

GAS SENSING PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRUCTURAL PROPERTIES; TIN OXIDES;

TIN COMPOUNDS;

EID: 0030213751     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00188955     Document Type: Article

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