Characterization of the Si- SiO2 interface following room temperature ammonia plasma exposure

Journal of the Electrochemical Society

Volumn 154, Issue 6, 2007, Pages

  Jin, Hao ^a,b   Weber, K J ^a   Smith, P J ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b ELECTROCHEMICAL SOCIETY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA PLASMA EXPOSURE; OXYNITRIDE LAYERS; PARAMAGNETIC DEFECTS;

AMMONIA; ELECTRIC PROPERTIES; HEAT TREATMENT; NITRIDATION; PLASMA APPLICATIONS; SILICA; SILICON; THERMAL EFFECTS;

INTERFACES (MATERIALS);

EID: 34547209364     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2716554     Document Type: Article

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