Low temperature perovskite crystallization of 70%Pb Mg13 Nb23 O3 -30%PbTi O3 thin films deposited by sputtering and their electrical performance evaluation

Applied Physics Letters

Volumn 91, Issue 3, 2007, Pages

  Detalle, M ^a   Rmiens D ^a   Wang, G ^b   Roussel, P ^c   Dkhil, B ^d  

^a UNIVERSITÉ DE VALENCIENNES   (France)

^b SHANGHAI INSTITUTE OF CERAMICS   (China)

^c UNITÉ DE CATALYSE ET DE CHIMIE DU SOLIDE   (France)

^d ECOLE CENTRALE PARIS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; LOW TEMPERATURE OPERATIONS; MEMS; PERMITTIVITY; PEROVSKITE; SPUTTER DEPOSITION;

ANNEALING TREATMENT; ELECTROMECHANIC PROPERTIES; PEROVSKITE PHASES;

THIN FILMS;

EID: 34547208061     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2749859     Document Type: Article

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