Wet etched high aspect ratio microstructures on quartz for MEMS applications

IEEJ Transactions on Sensors and Micromachines

Volumn 127, Issue 7, 2007, Pages 337-342

  Liang, Jinxing ^a   Kohsaka, Fusao ^b   Matsuo, Takahiro ^b   Ueda, Toshitsugu ^b  

^a Sakamoto Electric MFG Co Ltd   (Japan)

^b WASEDA UNIVERSITY   (Japan)

Author keywords

Anisotropic etching; High aspect ratio; MEMS; Microcapillary; Quartz; Tilt sensor

Indexed keywords

ANISOTROPIC ETCHING; ASPECT RATIO; MEMS; QUARTZ; SCANNING ELECTRON MICROSCOPY; WET ETCHING;

AMMONIUM BIFLUORIDE SOLUTION; MICROCAPILLARY; TILT SENSOR;

MICROSTRUCTURE;

EID: 34547200563     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.127.337     Document Type: Article

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