Selective reflection spectroscopy on the UV third-resonance line of Cs: Simultaneous probing of a van der Waals atom-surface interaction sensitive to far IR couplings and interatomic collisions

Laser Physics

Volumn 17, Issue 7, 2007, Pages 983-992

  De Souza Segundo, P Chaves ^a   Hamdi, I ^a   Fichet, M ^a   Bloch, D ^a   Ducloy, M ^a  

^a UNIVERSITÉ PARIS 13   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; INTERFACES (MATERIALS); SAPPHIRE; SPECTROSCOPIC ANALYSIS; VAN DER WAALS FORCES;

ATOM SURFACE INTERACTION; HYPERFINE COMPONENTS; SELECTIVE REFLECTION SPECTROSCOPY; SURFACE VAN DER WAALS INTERACTION;

ULTRAVIOLET RADIATION;

EID: 34547163913     PISSN: 1054660X     EISSN: 15556611     Source Type: Journal    
DOI: 10.1134/S1054660X07070134     Document Type: Article

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35. No significant deviation to this hypothesis can be established through our various attempts to fit the SR spectra with parameters allowing a dependence on the hyperfine component (e.g., for the pressure effect or the vW interaction).
36. Note that the frequency referencing operated for each individual hyperfine component is responsible for some uncertainties in the frequency scale, owing to micrononlinearities affecting the frequency scan. The relative distance between the components of the SA reference can, indeed, appear in slight disagreement with the expected hyperfine structure.
37. Even if an absolute calibration of the SR signal often appears to be delicate (e.g., theΔR/R value may be affected by scattering losses for the nonresonant reflection coefficient R), the information on the relative amplitude is significant when comparing spectra solely differing by atomic density.
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