Copper Pthalocyanine by XPS

Surface Science Spectra

Volumn 8, Issue 2, 2001, Pages 87-96

  Adolphi, Barbara ^a   Berger, Olena ^a   Fischer, Wolf Joachim ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; COPPER; CRYSTAL ORIENTATION; DEPOSITION RATES; FILM GROWTH; SILICA; SILICON OXIDES; SILICON WAFERS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER PTHALOCYANINE; PHASES TRANSFORMATION; POLYCRYSTALLINE; PREFERENTIAL ORIENTATION; SEPARATE CHAMBER; SIO 2 LAYER; SUBSTRATES TEMPERATURE; THIN-FILMS; Α - FORM; Β TRANSFORMATION;

THIN FILMS;

EID: 3442883657     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20010603     Document Type: Article

References (6)

1. O.Berger, W.-J.Fischer, B.Adolphi, S.Thierbach, V.Melev, and J.Schreiber, J. Mater. Sci., Mater. Electron. 11, 331 (2000).
2. G.Dufour et al., Surf. Sci. 319, 251 (1994).
3. B.Adolphi, O.Berger, and W.-J.Fischer, Appl. Surf. Sci. 179, 102 (2001).
4. L.Ottaviano et al., Surf. Sci. 373, 318 (1997).
5. U.Gelius, C. J.Allan, G.Johansson, and H.Siegbahn, Phys. Scr. 3, 237 (1971).
6. Handbook of XPS, edited by J.Chastain and R. C.King, Jr. (Physical Electronics, Eden Prairie, MN).