Anodic etching characteristics of n-type silicon in aqueous HF/KIO 3 solution

Journal of the Electrochemical Society

Volumn 154, Issue 8, 2007, Pages

  Tamura, Tomoyuki ^a   Adachi, Sadao ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; ELECTROLYTES; ETCHING; HYDROFLUORIC ACID; INTERFACIAL ENERGY; OPTICAL MICROSCOPY; PHOTOLUMINESCENCE; QUANTUM CONFINEMENT; SCANNING ELECTRON MICROSCOPY;

ANODIC CURRENT DENSITY; ANODIC ETCHING; ENERGY-BAND DIAGRAMS; MACROPORES;

SILICON;

EID: 34347334606     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2742332     Document Type: Article

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