Grain nucleation and grain growth during crystallization of HWCVD a-Si:H films

Materials Research Society Symposium Proceedings

Volumn 910, Issue , 2007, Pages 175-180

  Ahrenkiel, S P ^a   Roy, B ^b   Mahan, A H ^a   Ginley, D S ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b Department of Metallurgical and Materials Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS THICKNESS; HYDROGEN CONTENT; PHASE-CHANGE KINETICS; RANDOMLY DISTRIBUTED GRAINS;

CHEMICAL VAPOR DEPOSITION; GRAIN GROWTH; GRAIN SIZE AND SHAPE; HYDROGENATION; IMAGE PROCESSING; MOLYBDENUM; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS SILICON;

EID: 34249934597     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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