Production technologies of film solar cell

Materials Research Society Symposium Proceedings

Volumn 910, Issue , 2007, Pages 687-697

  Takano, Akihiro ^a   Tabuchi, Katsuya ^a   Uno, Masayoshi ^a   Tanda, Masayuki ^a   Wada, Takehito ^a   Shimosawa, Makoto ^a   Sakakibara, Yasushi ^a   Kiyofuji, Shinji ^a   Nishihara, Hironori ^a   Enomoto, Hirofumi ^a   Kamoshita, Tomoyoshi ^a  

^a FUJI ELECTRIC CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; MICROFABRICATION; OXIDE FILMS; PLASTIC FILMS;

OXIDE FILM DEPOSITION; SELECTIVE REACTIVE SPUTTERING; SUBSTRATE TEMPERATURE;

SILICON SOLAR CELLS;

EID: 34249933940     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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