Highly Texturized Silver Electrode Deposition Using Roll-to-Roll Low-Temperature Sputtering Process

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 2 B, 2004, Pages

  Takano, Akihiro ^a   Uno, Masayoshi ^a   Tanda, Masayuki ^a   Iwasaki, Shinji ^a   Tanaka, Hiroko ^a   Yasuda, Junko ^a   Kamoshita, Tomoyoshi ^a  

^a FUJI ELECTRIC CO   (Japan)

Author keywords

Ag; Amorphous silicon solar cell; Flexible film substrate; Large area; Roll to roll; Textured electrode

Indexed keywords

AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; HEAT RESISTANCE; LIGHT SCATTERING; LOW TEMPERATURE EFFECTS; MORPHOLOGY; PLASTIC FILMS; POLYIMIDES; ROLLING; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SHORT CIRCUIT CURRENTS; SILVER; SOLAR CELLS; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS SILICON SOLAR CELLS; FLEXIBLE FILM SUBSTRATES; LARGE AREAS; ROLL-TO-ROLL PROCESS; TEXTURED ELECTRODES;

ELECTRODEPOSITION;

EID: 2142750240     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.43.l277     Document Type: Article

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