The effect of sputtering gas on the materials and electrical characteristics of p-Si films formed by DC magnetron sputtering

Materials Research Society Symposium Proceedings

Volumn 685, Issue , 2001, Pages 257-262

  Voutsas, A T ^a  

^a SHARP LABORATORIES OF AMERICA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EXCIMER LASERS; LASER BEAM EFFECTS; MAGNETRON SPUTTERING; POLYSILICON; THIN FILM TRANSISTORS;

DEPOSITION RATE; PLASMA VOLTAGE; SPUTTERED FILMS; SPUTTERING GAS;

POLYMER FILMS;

EID: 34249913712     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-685-d7.3.1     Document Type: Conference Paper

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