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Volumn 508, Issue , 1998, Pages 67-72
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Co-optimization of Si thin-film deposition & excimer laser anneal processes for fabrication of high performance p-Si TFTs
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CRYSTALLIZATION;
EXCIMER LASERS;
GRAIN SIZE AND SHAPE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
EXCIMER LASER ANNEALING (ELA);
LASER ENERGY DENSITY;
POLYSILICON THIN FILM TRANSISTORS;
THIN FILM TRANSISTORS;
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EID: 0032305930
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-508-67 Document Type: Conference Paper |
Times cited : (1)
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References (12)
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