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Volumn 508, Issue , 1998, Pages 67-72

Co-optimization of Si thin-film deposition & excimer laser anneal processes for fabrication of high performance p-Si TFTs

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; EXCIMER LASERS; GRAIN SIZE AND SHAPE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032305930     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-508-67     Document Type: Conference Paper
Times cited : (1)

References (12)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.