Novel spin-on hard mask with Si-containing bottom antireflective coating for nanolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 3, 2007, Pages 868-872

  Choi, Sang Jun ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NANOLITHOGRAPHY; OPTIMIZATION; SEMICONDUCTOR DEVICES; THICKNESS MEASUREMENT;

ETCHING RESISTANCE; NUMERICAL APERTURE (NA); OPTICAL SIMULATION; SPIN-ON HARD (SOH) MASK SYSTEM;

ANTIREFLECTION COATINGS;

COATINGS; DEPOSITION; LITHOGRAPHY; OPTIMIZATION; SEMICONDUCTOR DEVICES;

EID: 34249865336     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2732740     Document Type: Article

References (4)

1. W. Liu, Proc. SPIE 5040, 841 (2003).
2. D. J. Abdalah, Proc. SPIE 5753, 417 (2005).
3. K. Babich, Proc. SPIE 5039, 152 (2003).
4. T. Shibata, Proc. SPIE 4690, 773 (2002).