Positive and negative pulse etching method of porous silicon fabrication

Chinese Physics Letters

Volumn 24, Issue 5, 2007, Pages 1361-1364

  Ge, Jin ^a   Yin, Wen Jing ^a   Long, Yong Fu ^a   Ding, Xun Min ^a   Hou, Xiao Yuan ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLYTES; ETCHING; FABRICATION; MICROPOROSITY; MONOLAYERS; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS;

ETCHING EFFECT; ETCHING METHOD; MICROPORES; NEGATIVE PULSE; NEGATIVE PULSE VOLTAGE; OPTICAL THICKNESS; POSITIVE PULSE; REFLECTANCE SPECTRUM; SI-H BONDS; VERTICAL ETCHING;

POROUS SILICON;

EID: 34249297389     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/24/5/065     Document Type: Article

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