Ferroelectric BaTi O3 thin films on Ni metal tapes using NiO as buffer layer

Applied Physics Letters

Volumn 90, Issue 20, 2007, Pages

  Yuan, Z ^a   Liu, J ^a   Weaver, J ^a   Chen, C L ^a,b   Jiang, J C ^c   Lin, B ^d   Giurgiutiu, V ^d   Bhalla, A ^e   Guo, R Y ^e  

^a UNIVERSITY OF TEXAS AT SAN ANTONIO   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

^c University of Texas at Arlington   (United States)

^d The Department of Mechanical Engineering   (United States)

^e PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYSTERESIS LOOP; METAL TAPES; PIEZOELECTRIC RESPONSE;

BARIUM TITANATE; DIELECTRIC LOSSES; INTERDIFFUSION (SOLIDS); NICKEL; PERMITTIVITY; PULSED LASER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FERROELECTRIC THIN FILMS;

EID: 34249095529     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2739082     Document Type: Article

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