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Volumn 17, Issue 2, 2007, Pages 238-244

Silicon microneedle formation using modified mask designs based on convex corner undercut

Author keywords

[No Author keywords available]

Indexed keywords

CUTTING; MASKS; MICROFABRICATION; POTASSIUM COMPOUNDS; SILICON; SOLUTIONS;

EID: 34249085645     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/2/008     Document Type: Article
Times cited : (46)

References (12)
  • 1
    • 1542358759 scopus 로고    scopus 로고
    • Microneedles for transdermal drug delivery
    • Prausnitz M 2004 Microneedles for transdermal drug delivery Adv. Drug Deliv. Rev. 56 581-7
    • (2004) Adv. Drug Deliv. Rev. , vol.56 , Issue.5 , pp. 581-587
    • Prausnitz, M.1
  • 3
    • 18144397536 scopus 로고    scopus 로고
    • Microsystems for drug and gene delivery
    • Reed M L and Lye W-K 2004 Microsystems for drug and gene delivery Proc. IEEE 92 56-75
    • (2004) Proc. IEEE , vol.92 , Issue.1 , pp. 56-75
    • Reed, M.L.1    Lye, W.-K.2
  • 5
    • 22144493011 scopus 로고    scopus 로고
    • Process optimisation and characterisation of silicon microneedles fabricated by wet etch technology
    • Wilke N, Ye S-R, Mulcahy A and Morrissey A 2005 Process optimisation and characterisation of silicon microneedles fabricated by wet etch technology Microelectron. J. 36 650-6
    • (2005) Microelectron. J. , vol.36 , Issue.7 , pp. 650-656
    • Wilke, N.1    Ye, S.-R.2    Mulcahy, A.3    Morrissey, A.4
  • 8
    • 0025497671 scopus 로고
    • Methods for the fabrication of convex corners in anisotropic etching of (1 0 0) silicon in aqueous KOH
    • Offereins H L, Kohl K and Sandmaier H 1991 Methods for the fabrication of convex corners in anisotropic etching of (1 0 0) silicon in aqueous KOH Sensors Actuators A 25-27 9-13
    • (1991) Sensors Actuators , vol.25-27 , pp. 9-13
    • Offereins, H.L.1    Kohl, K.2    Sandmaier, H.3
  • 9
    • 0036544447 scopus 로고    scopus 로고
    • A model explaining mask-corner undercut phenomena in anisotropic silicon etching: A saddle point in the etching rate diagram
    • Shikida M et al 2002 A model explaining mask-corner undercut phenomena in anisotropic silicon etching: a saddle point in the etching rate diagram Sensors Actuators A 97-98 758-63
    • (2002) Sensors Actuators , vol.97-98 , Issue.3 , pp. 758-763
    • Shikida, M.1    Al, E.2
  • 10
    • 33645103056 scopus 로고    scopus 로고
    • The evolution from convex corner undercut towards microneedle formation: Theory and experimental verification
    • Wilke N, Reed M L and Morrissey A 2006 The evolution from convex corner undercut towards microneedle formation: theory and experimental verification J. Micromech. Microeng. 16 808-14
    • (2006) J. Micromech. Microeng. , vol.16 , Issue.4 , pp. 808-814
    • Wilke, N.1    Reed, M.L.2    Morrissey, A.3
  • 11
    • 0031221973 scopus 로고    scopus 로고
    • New structure for corner compensation in anisotropic KOH etching
    • Enoksson P 1997 New structure for corner compensation in anisotropic KOH etching J. Micromech. Microeng. 7 141-4
    • (1997) J. Micromech. Microeng. , vol.7 , Issue.3 , pp. 141-144
    • Enoksson, P.1
  • 12
    • 0029328223 scopus 로고
    • Compensating corner undercutting in anisotropic etching of (1 0 0) silicon for chip separation
    • Scheibe C and Obermeier E 1995 Compensating corner undercutting in anisotropic etching of (1 0 0) silicon for chip separation J. Micromech. Microeng. 5 109-11
    • (1995) J. Micromech. Microeng. , vol.5 , Issue.2 , pp. 109-111
    • Scheibe, C.1    Obermeier, E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.