Advanced CMOS device technologies for 45 nm node and below

Science and Technology of Advanced Materials

Volumn 8, Issue 3, 2007, Pages 214-218

  Veloso, A ^a   Hoffmann, T ^a   Lauwers, A ^a   Yu, H ^a   Severi, S ^a   Augendre, E ^a   Kubicek, S ^a   Verheyen, P ^a   Collaert, N ^a   Absil, P ^a   Jurczak, M ^a   Biesemans, S ^a  

^a IMEC   (Belgium)

Author keywords

CMOS scaling; FUSI; Metal gates; Strain boosters

Indexed keywords

ELECTRIC EXCITERS; LEAKAGE CURRENTS; MOSFET DEVICES; OSCILLATORS (ELECTRONIC); SILICIDES;

CMOS SCALING; METAL GATES; STRAIN BOOSTERS;

CMOS INTEGRATED CIRCUITS;

EID: 34249037392     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.stam.2006.11.018     Document Type: Article

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