Chemical analysis of acidic silicon etch solutions. II. Determination of HNO3, HF, and H2SiF6 by ion chromatography

Talanta

Volumn 72, Issue 4, 2007, Pages 1540-1545

  Acker, Jörg ^a,c   Henßge, Antje ^b,c  

^a UNIVERSITY OF APPLIED SCIENCES   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c IFW DRESDEN   (Germany)

Author keywords

H2SiF6; HF HNO3 etch solution; Ion chromatography; Silicon

Indexed keywords

ETCHING; ION CHROMATOGRAPHY; ION SELECTIVE ELECTRODES; NITRATES; NITRIC ACID; SOLUTIONS;

ETCH RATE; FLUORIDE CONTENT; ISOTROPIC CHEMICAL ETCHING;

SILICON;

EID: 34248340461     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2007.02.005     Document Type: Article

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