Defectivity in water immersion lithography

Microlithography World

Volumn 14, Issue 4, 2005, Pages

  Okoroanyanwu, Uzodinma ^a   Kye, Jongwook ^a   Yamamoto, Norihiro ^b   Cummings, Kevin ^c  

^a ADVANCED MICRO DEVICES   (United States)

^b Submicron Development Center   (United States)

^c ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; BUBBLES (IN FLUIDS); COMPOSITION; COMPUTER SIMULATION; DEFECTS; MORPHOLOGY; SURFACE REACTIONS; WATER;

BRIDGING DEFECTS; DRYING STAINS; LIQUID VAPOR INTERFACIAL INTERACTION DEFECTS; SURFACE PARTICLES; WATER IMMERSION LITHOGRAPHY; WATER MARKS;

LITHOGRAPHY;

EID: 28844453024     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (10)

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