Photosensitized DNA damage and its protection via a novel mechanism

Photochemistry and Photobiology

Volumn 83, Issue 1, 2007, Pages 205-212

  Hiraku, Yusuke ^a   Ito, Kimiko ^b   Hirakawa, Kazutaka ^c   Kawanishi, Shosuke ^a,d  

^a MIE UNIVERSITY GRADUATE SCHOOL OF MEDICINE   (Japan)

^b Tsu City College   (Japan)

^c SHIZUOKA UNIVERSITY   (Japan)

^d SUZUKA UNIVERSITY OF MEDICAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DNA FORMAMIDOPYRIMIDINE GLYCOSYLASE; FREE RADICAL; GUANINE; HYDROGEN PEROXIDE; METAL; OXYGEN; PHOTOSENSITIZING AGENT; RIBOFLAVIN; SINGLET OXYGEN; SUPEROXIDE; UNCLASSIFIED DRUG; XANTHONE; XANTHONE DERIVATIVE;

CHEMICAL MODEL; CHEMISTRY; CONFERENCE PAPER; DNA DAMAGE; DRUG ANTAGONISM; DRUG EFFECT; ELECTRON TRANSPORT; HUMAN; METABOLISM; PATHOLOGY; PHYSIOLOGY; RADIATION EXPOSURE; SKIN TUMOR; ULTRAVIOLET RADIATION;

DNA DAMAGE; DNA-FORMAMIDOPYRIMIDINE GLYCOSYLASE; ELECTRON TRANSPORT; FREE RADICALS; GUANINE; HUMANS; HYDROGEN PEROXIDE; METALS; MODELS, CHEMICAL; OXYGEN; PHOTOSENSITIZING AGENTS; RIBOFLAVIN; SINGLET OXYGEN; SKIN NEOPLASMS; SUPEROXIDES; ULTRAVIOLET RAYS; XANTHONES;

EID: 34247842988     PISSN: 00318655     EISSN: None     Source Type: Journal    
DOI: 10.1562/2006-03-09-IR-840     Document Type: Conference Paper

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