Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 750-754

  Chen, H L ^a   Huang, K T ^a   Lin, C H ^b   Wang, W Y ^a   Fan, Wonder ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

Antireflection structures; Modified illumination; Optical lithography; Pyramid structures; Solar cells

Indexed keywords

DRY ETCHING; LIGHT SOURCES; PHOTOLITHOGRAPHY; REFLECTION; TWO DIMENSIONAL; WAVELENGTH;

ANTIREFLECTION STRUCTURES; MODIFIED ILLUMINATION; PYRAMID STRUCTURES;

SOLAR CELLS;

EID: 34247645561     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.026     Document Type: Article

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