Fabrication of integrated patterns using lithography and particles assembling techniques

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1471-1475

  Shi, J ^a,b   Guo, S S ^a   Sun, M H ^c   Baigl, D ^a   Chen, Y ^a,b  

^a ECOLE NORMALE SUPÉRIEURE   (France)

^b CNRS   (France)

^c PEKING UNIVERSITY   (China)

Author keywords

Nanoimprint lithography; Nanoparticles; Self assembling

Indexed keywords

DNA; MICROFLUIDICS; NANOIMPRINT LITHOGRAPHY; NANOPARTICLES; SELF ASSEMBLY; SUBSTRATES;

FUNCTIONALIZED PARTICLES; INTEGRATED PATTERNS; MICROFLUIDIC CHANNELS;

ELECTRON BEAM LITHOGRAPHY;

GELS; LITHOGRAPHY; ULTRAVIOLET RADIATION;

EID: 34247643903     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.189     Document Type: Article

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