EBL Bi-layer resist scheme for CdTe/Si submicron structures for lift-off processing

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1117-1119

  Abellan M ^a   Anguita, J ^a   Sochinskii, N V ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE MADRID   (Spain)

Author keywords

CdTe; EBL resist processing; Lift off; Multilayers resist; Photonic structures

Indexed keywords

CADMIUM COMPOUNDS; DETECTORS; EDGE DETECTION; ELECTRON BEAM LITHOGRAPHY; IMAGE PROCESSING; MICROSTRUCTURE; SURFACE ROUGHNESS;

EBL RESIST PROCESSING; MULTILAYERS RESISTS; PHOTONIC STRUCTURES;

MICROFABRICATION;

EID: 34247559738     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.077     Document Type: Article

References (8)

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