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Volumn 84, Issue 5-8, 2007, Pages 1058-1061

Combined electron beam and UV lithography in SU-8

Author keywords

Combined lithography; Electron beam lithography; Nanolithography; SU 8

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; NANOTECHNOLOGY; POLYMER FILMS; WSI CIRCUITS;

EID: 34247551257     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.084     Document Type: Article
Times cited : (18)

References (10)
  • 6
    • 34247640577 scopus 로고    scopus 로고
    • note
    • SU-8 formulation 2002 from MicroChem. Corp. , diluted with pure cyclopentanone to a 13 wt% mass percentage solid content solution.
  • 10
    • 34247624937 scopus 로고    scopus 로고
    • note
    • mr-I T85 from micro resist technology GmbH. .


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.