Nanocrystal formation of metals in thermally grown thin silicon dioxide layer by ion implantation and thermal diffusion of implanted atoms in heat treatment

Journal of Physics: Conference Series

Volumn 61, Issue 1, 2007, Pages 41-45

  Arai, N ^a,b   Tsuji, H ^a   Gotoh, N ^a   Minotani, T ^a   Ishibashi, T ^a   Adachi, K ^b   Kotaki, H ^b   Gotoh, Y ^a   Ishikawa, J ^a  

^a KYOTO UNIVERSITY   (Japan)

^b SHARP CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34247470852     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/61/1/009     Document Type: Article

References (11)

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