Delta layer formation of silver nanoparticles in thin silicon dioxide film by negative ion implantation

Surface and Coatings Technology

Volumn 196, Issue 1-3 SPEC. ISS., 2005, Pages 39-43

  Tsuji, Hiroshi ^a   Arai, Nobutoshi ^a,b   Matsumoto, Takuya ^a   Ueno, Kazuya ^a   Adachi, Kouichiro ^b   Kotaki, Hiroshi ^b   Gotoh, Yasuhito ^a   Ishikawa, Junzo ^a  

^a KYOTO UNIVERSITY   (Japan)

^b SHARP CORPORATION   (Japan)

Author keywords

Delta layered nanoparticles; Ion implantation; Nanoparticles

Indexed keywords

ANNEALING; BOUNDARY CONDITIONS; CAPACITANCE; COULOMB BLOCKADE; GOLD; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; SILICA; THIN FILMS;

DELTA LAYER FORMATION; DEPTH DISTRIBUTION; GATE OXIDE FILMS; THERMAL GROWTH;

SILVER;

NANOPARTICLE;

EID: 18144421124     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.088     Document Type: Article

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