Noise measurements on NbN thin films with a negative temperature resistance coefficient deposited on sapphire and on SiO2

Fluctuation and Noise Letters

Volumn 7, Issue 1, 2007, Pages

  Leroy, G ^a   Gest, J ^a   Vandamme, L K J ^b   Bourgeois, O ^c  

^a UNIVERSITÉ DU LITTORAL CÔTE D OPALE   (France)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c CNRS   (France)

Author keywords

1 f noise; Nbn; Noise measurements; Semiconductor; Thin film material

Indexed keywords

EID: 34147182619     PISSN: 02194775     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0219477507003660     Document Type: Article

References (13)

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