Characterization of ZnO-degraded varistors used in high-tension devices

Materials Research Bulletin

Volumn 42, Issue 6, 2007, Pages 1159-1168

  Ramirez M A ^a,b   Simoes A Z ^b   Marquez M A ^a   Maniette, Y ^b   Cavalheiro, A A ^b   Varela, J A ^b  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

^b SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

Author keywords

A. Ceramics; C. Electron microscopy; D. Electrical properties

Indexed keywords

DEGRADATION; ELECTRIC PROPERTIES; ELECTRON MICROSCOPY; MICROSTRUCTURE; RIETVELD REFINEMENT; ZINC OXIDE;

DEGRADED VARISTORS; HIGH TENSION DEVICES; LATTICE MICROSTRAIN; SPINEL PHASES;

VARISTORS;

EID: 34047270091     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2006.09.001     Document Type: Article

References (27)

1. Gupta T.K. J. Am. Ceram. Soc. 73 (1990) 1817-1840
2. Clarke D.R. J. Am. Ceram. Soc. 82 (1999) 485-502
3. Souza F.L., Gómez J.W., Bueno P.R., Cássia-Santos M.R., Araújo A.L., Leite E.R., Longo E., and Varela A.J. Mater. Chem. Phys. 80 (2003) 512-517
4. Gupta T.K., and Carlson W.G. J. Mater. Sci. 20 (1985) 3847-3854
5. Ramírez M.A., Bueno P.R., Ribeiro W.C., Varela J.A., Bonett D.A., Villa J.M., Márquez M.A., and Rojo C.R. J. Mater. Sci. 40 21 (2005) 5591-5596
6. Sonder E., Austin M.M., and Kinser D.L. J. Appl. Phys. 54 (1983) 3566-3572
7. Lee W.I., and Young R.L. Appl. Phys. Lett. 69 4 (1996) 526-528
8. Leite E.R., Varela J.A., and Longo E. J. Mater. Sci. 27 (1991) 5325-5329
9. Bueno P.R., Leite E.R., Oliveira M.M., Orlandi M.O., and Longo E. Appl. Phys. Lett. 79 (2001) 48-50
10. Zhou D., Zhan C., and Gong S. Mater. Sci. Eng. B 99 (2003) 412-415
11. Bui A., Loubiere A., and Hassanzadeh M. J. Appl. Phys. 65 10 (1989) 4048-4050
12. Modine F.A., and Whecler R.B. J. Appl. Phys. 67 10 (1990) 5566-6560
13. Gupta T.K., and Carlson W.G. J. Appl. Phys. 53 11 (1982) 7401-7409
14. Stucki F., and Greuter F. Appl. Phys. Lett. 57 5 (1990) 446-448
15. Olsson E., and Dunlop G.L. J. Appl. Phys. 66 8 (1989) 3656-3675
16. Elfwin M., Osterlund R., and Olsson E. J. Am. Ceram. 83 9 (2000) 2311-2317
17. Tao M., Bui A., Dorlanne O., and Loubiere A. J. Appl. Phys. 61 (1987) 1562-1572
18. Cao Z.-C., Wu R.-J., and Song R.-S. Mater. Sci. Eng. B 22 (1994) 261-268
19. Wang H., Li W., and Cordaro J.F. Jpn. J. Appl. Phys. 34 (1995) 1765-1772
20. Wang H., Schulze W.A., and Cordaro J.F. Jpn. J. Appl. Phys. 34 (1995) 2352-2358
21. Wen Q., and Clarke D.R. In: Levinson L.M., and Hirno S.I. (Eds). Ceramic Transactions, Vol. 41: Grain Boundaries and Interfacial Phenomena in Electronic Ceramics (1994), Am. Ceram. Soc., Westerville, OH 217-230
22. Young R.A., Larson A.C., and Paiva-Santos C.O. User's Guide to Program DBWS-9807 for Rietveld Analysis (1998), Georgia Inst. Tech., Atlanta GA30332
23. Bueno P.R., Oliveira M.M., Bacelar-Junior W.K., Leite E.R., Longo E., Garcia-Belmonte G., and Bisquert J. J. Appl. Phys. 91 (2002) 6007-6012
24. Dage S.R., and Ravi V. Appl. Phys. Lett. 83 22 (2003) 4539-4541
25. Eda E. J. Appl. Phys. 56 (1984) 2948-2954
26. Haskell B.A., Souri S.J., and Helfand M.A. J. Am. Ceram. Soc. 82 8 (1999) 2106-2110
27. Recnik A., Daneu N., Walther T., and Mader W. J. Am. Ceram. Soc. 84 11 (2001) 2657-2668