Laser induced damage of multi-layer dielectric used in pulse compressor gratings

Chinese Optics Letters

Volumn 3, Issue 3, 2005, Pages 181-183

  Kong, Weijin ^a,b   Zhao, Yuanan ^a   Wang, Tao ^a   Shao, Jianda ^a   Fan, Zhengxiu ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; DIELECTRIC MATERIALS; DIFFRACTION GRATINGS; ELECTRIC FIELDS; EVAPORATION; MORPHOLOGY; OPTICAL MULTILAYERS; PITTING;

E BEAM EVAPORATION; LASER INDUCED DAMAGE THRESHOLD; NOMARSKI MICROSCOPE; PIT CONCAVE PLAT STRUCTURE; PULSE COMPRESSOR GRATINGS; TRANSVERSE ELECTRIC MODE;

LASER DAMAGE;

EID: 17244371842     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

1. C. D. Li, Z. Q. Zhang, and Z. Z. Xu, Acta Opt. Sin. (in Chinese) 16, 1077 (1996).
2. J. J. Yang, Y. L. Sun, S. C. Ruan, S. C. Wang, S. Feng, and X. Hou, Acta Opt. Sin. (in Chinese) 18, 457 (1998).
3. C. P. Hauri, P. Squire, G. Arisholm, J. Biegert, and U. Keller, Opt. Lett. 29, 1369 (2004).
4. M. D. Perry, R. D. Boyd, J. A. Britten, D. Decker, and B. W. Shore, Opt. Lett. 20, 940 (1995).
5. L. Li and J. Hirsh, Opt. Lett. 20, 1349 (1995).
6. J. A. Britten, M. D. Perry, B. W. Shore, R. D. Boyd, G. E. Loomis, and R. Chow, Proc. SPIE 2714, 511 (1996).
7. B. W. Shore, M. D. Perry, J. A. Britten, R. D. Boyd, M. D. Feit, H. T. Nguyen, R. Chow, G. E. Loomis, and L. Li, J. Opt. Soc. Am. A 14, 1124 (1997).
8. K. Hehl, J. Bischoff, U. Mohaupt, M. Palme, B. Schnabel, L. Wente, R. Bödefeld, W. Theobald, E. Welsch, R. Sanerbrey, and H. Heyer, Appl. Opt. 38, 6257 (1999).
9. J. D. T. Kruschwitz and W. T. Pawlewicz, Appl. Opt. 36, 2157 (1997).
10. J. M. Yuan, Z. S. Tang, H. J. Qi, J. D. Shao, and Z. X. Fan, Acta Opt. Sin. 23, 984 (2003).
11. ISO 11254-2: Lasers and Laser-Related Equipment - Determination of Laser-Induced Damage Threshold of Optical Surfaces - Part 1: s-on-1 Test (1995).
12. Laser-induced damage threshold and certification procedure for optical materials (NASA Reference Publication 1395, Langley Research Center· Hampton, Virginia, 1997).