Fabrication of nanoscale SiC-based ceramic patterns with near-zero residual layers by using imprinting technique and reactive ion etching

Materials Science Forum

Volumn 510-511, Issue , 2006, Pages 766-769

  Park, Kyoung Hoon ^a   Park, Jun Hong ^a   Kim, Dong Pyo ^a  

^a Chungnam National University   (South Korea)

Author keywords

Non oxide ceramics; Reactive ion etching; Soft lithography

Indexed keywords

CERAMIC MATERIALS; FABRICATION; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PYROLYSIS; REACTIVE ION ETCHING;

MOLDING PRESSURE; NEAR-ZERO RESIDUAL LAYERS; POLYVINYLSILANE; SPIN-COATING CONDITIONS;

SILICON CARBIDE;

EID: 34047111457     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-995-4.766     Document Type: Conference Paper

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