Fabrication of metallic nanomasks by transfer of self-organized nanodot patterns from semiconductor material into thin metallic layers

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 257, Issue 1-2 SPEC. ISS., 2007, Pages 771-776

  Bobek, T ^a   Kurz, H ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Etching; Ion erosion; Nanolithography; Pattern; Self organization; Transfer

Indexed keywords

AMORPHOUS ALLOYS; FERROMAGNETIC MATERIALS; MATHEMATICAL MODELS; MICROFABRICATION; NANOLITHOGRAPHY; REACTIVE ION ETCHING;

ION EROSION; NANOMASKS; SELF ORGANIZATION; THIN METALLIC LAYERS;

MASKS;

EID: 33947691786     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.01.118     Document Type: Article

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