Cluster ion beam process technology - 20 years of R&D history

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 257, Issue 1-2 SPEC. ISS., 2007, Pages 632-638

  Yamada, Isao ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Cluster ion beams; Lateral sputtering; Shallow implantation; Surface smoothing

Indexed keywords

ATOMIC PHYSICS; DIELECTRIC PROPERTIES; ETCHING; RESEARCH AND DEVELOPMENT MANAGEMENT; SEMICONDUCTOR DEVICES; SURFACE TREATMENT;

CLUSTER ION BEAMS; LATERAL SPUTTERING; SHALLOW IMPLANTATION; SURFACE SMOOTHING;

ION BEAMS;

EID: 33947690613     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.01.124     Document Type: Article

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