Oxidation behavior of sputter-deposited Ti-Ni thin films at elevated temperatures

Materials Characterization

Volumn 58, Issue 5, 2007, Pages 471-478

  Zhang, Lei ^a   Xie, Chaoying ^a   Wu, Jiansheng ^a  

^a Department of Materials Science   (China)

Author keywords

Oxidation kinetics; Structure; Surface roughness; TiNi thin films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; OXIDATION; REACTION KINETICS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THERMAL EFFECTS; X RAY DIFFRACTION;

OXIDATION KINETICS; OXIDATION TEMPERATURE; TINI THIN FILMS;

THIN FILMS;

EID: 33947663509     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchar.2006.06.011     Document Type: Article

References (16)

1. Fu Y.Q., Du H., Huang W., Zhang S., and Hu M. TiNi-based thin films in MEMS applications: a review. Sens Actuators, A, Phys 112 (2004) 395-408
2. Makino E., Mitsuya T., and Shibata T. Dynamic actuation properties of TiNi shape memory diaphragm. Sens Actuators, A, Phys 79 (2000) 128-135
3. Miyazaki S., and Ishida A. Martensitic transformation and shape memory behavior in sputter-deposited TiNi-base thin films. Mater Sci Eng, A Struct Mater: Prop Microstruct Process 273-275 (1999) 106-133
4. Surbled P., Clerc C., Le Pioufle B., Ataka M., and Fujita H. Effect of the composition and thermal annealing on the transformation temperatures of sputtered TiNi shape memory alloy thin films. Thin Solid Films 401 (2001) 52-59
5. Chu C.L., Wu S.K., and Yen YC. Oxidation behavior of equatomic TiNi alloy in high temperature air environment. Mater Sci Eng, A Struct Mater: Prop Microstruct Process 216 (1996) 193-200
6. Xu C.H., Ma X.Q., Shi S.Q., and Woo C.H. Oxidation behavior of TiNi shape memory alloy at 450-750 °C. Mater Sci Eng, A Struct Mater: Prop Microstruct Process 371 (2004) 45-50
7. Ko J.H., and Lee D.B. High temperature oxidation behavior of TiNi alloys. Mat Sci Forum 475-479 (2005) 853-856
8. Wang X.X., Mao Z.Y., Cao Z.W., Qing R.Y., Jiang X.C., and Peng S.Y. Oxide film and its effect on shape memory effect and biocompatibility in a TiNi alloy. Proc Int Symp on Shape Mem Mater, Beijing, China, September 25-28 (1994)
9. Nam T.H., Chung D.W., Lee H.W., Kim J.H., and Choi M.S. Effect of the surface oxide layer on transformation behavior and shape memory characteristics of TiNi and Ti-Ni-Mo alloys. J Mater Sci 38 (2003) 1333-1338
10. Kale A., Seal S., Sobczak N., Morgiel J., and Sundaram K.B. Effect of deposition temperature on the morphology, structure, surface chemistry and mechanical properties of magnetron sputtered Ti70-Al30 thin films on steel substrate. Surf Coat Technol (2001) 141-252
11. Huang X., and Liu Y. Some factors affecting the properties of sputter deposited NiTi-based shape memory alloy thin films. Proc SPIE Int Soc Opt Eng 4934 (2002) 210-218
12. Badini C., and Laurella F. Oxidation of FeCrAl alloy: influence of temperature and atmosphere on scale growth rate and mechanism. Surf Coat Technol 135 (2001) 291-298
13. Chu J.P., Lai Y.W., Lin T.N., and Wang S.F. Deposition and characterization of TiNi-base thin films by sputtering. Mater Sci Eng, A Struct Mater: Prop Microstruct Process 277 (2000) 11-17
14. Gisser Kathleen R.C., Busch J.D., Johnson A.D., and Ellis A.B. Oriented nickel-titanium shape memory alloy films prepared by annealing during deposition. Appl Phys Lett 61 (1992) 1632-1634
15. Miyazaki S., No V.H., Kitamura K., Khsntachawana A., and Hosoda H. Texture of Ti-Ni rolled thin plates and sputter-deposited thin films. Int Plas 16 (2000) 1135-1154
16. Szekeres A., Lytvyn P., and Alexandrova S. FM surface imaging of thermally oxidized hydrogenated crystalline silicon. Appl Surf Sci 191 (2002) 148-152