Numerical modeling of an Ar-H 2 radio-frequency plasma reactor under thermal and chemical nonequilibrium conditions

Plasma Chemistry and Plasma Processing

Volumn 27, Issue 2, 2007, Pages 189-204

  Ye, Rubin ^a   Murphy, Anthony B ^b   Ishigaki, Takamasa ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b CSIRO   (Australia)

Author keywords

Chemical kinetics; Chemical nonequilibrium; RF thermal plasmas; Species density; Thermal nonequilibrium

Indexed keywords

CHEMICAL NONEQUILIBRIUM; SPECIES DENSITY; THERMAL NONEQUILIBRIUM;

CARRIER CONCENTRATION; COMPUTATIONAL METHODS; COMPUTER SIMULATION; HYDROGENATION; INDUCTIVELY COUPLED PLASMA; MATHEMATICAL MODELS; REACTION KINETICS;

CHEMICAL REACTORS;

EID: 33947659884     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-007-9055-5     Document Type: Article

References (26)

1. Ishigaki T, Okada N, Ohashi N, Heneda H, Sakuta T (2002) Pure Appl Chem 74:435
2. Ohashi N, Ishigaki T, Okada N, Sekiguchi T, Sakaguchi I, Haneda H (2002) Appl Phys Lett 80:2869
3. Shakir S, Mynampati S, Pashaie B, Dhali SK (2006) J Appl Phys 99:073303
4. Shiozawa M, Nanbu K (2004) Thin Solid Films 457:48
5. Girshick SL, Li C, Wu BW, Han H (1993) Plasma Chem Plasma Process 13:169
6. Zhao GY, Mostaghimi J, Boulos MI (1990) Plasma Chem Plasma Process 10:133
7. Kolman D, Heberlein J, Pfender E, Young R (1996) Plasma Chem Plasma Process 16:578
8. Desilets M, Bilodeau J-F, Proulx P (1997) J Phys D 30:1951
9. Watanabe T, Tonoike N, Honda T, Kanzawa A (1991) J Chem Eng Japan 24:25
10. Watanabe T, Sugimoto N (2004) Thin Solid Films 457:201
11. Tanaka Y (2004) J Phys D 37:1190
12. Burm KTAL, Jodoin B, Proulx P, Boulos MI (2003) Plasma Source Sci Technol 12:362
13. Xue S, Proulx P, Murphy AB, Boulos MI (2005) Proc. ISPC-17. Toronto, Canada
14. Watanabe T, Atsuchi N, Shigeta M (2005) Proc. ISPC-17. Toronto, Canada
15. Mostaghimi J, Boulos MI (1989) Plasma Chem Plasma Process 9:25
16. Chen X, Pfender E (1991) Plasma Chem Plasma Process 1.1:103
17. Rat V, Andre P, Aubreton J, Elchinger MF, Fauchais P, Lefort A (2002) Plasma Chem Plasma Process 22:475
18. Kruger CH (1998) Plasma Chem Plasma Process 9:435
19. Richley E, Tuma DT (1982) J Appl Phys 53:8537
20. Boulos MI, Fauchais P, Pfender E (1994) Thermal plasmas Vol. 1: fundamentals and applications. Plenum, New York
21. http://physics.nist.gov/PhysRefData/
22. Devoto RS (1967) Phys Fluid 10:2105
23. Murphy AB (2000) Plasma Chem Plasma Process 20:279
24. Murphy AB, Arundell CJ (1994) Plasma Chem Plasma Process 14:451
25. Patankar SV (1980) Numerical heat transfer and fluid flow. McGraw-Hill, New York
26. Bourg F, Pellerin S, Morvan D, Amouroux J, Chapelle J (2002) J Phys D 35:2281