Structuring of low firing temperature PZT thick films by photolithography

Materials Research Society Symposium Proceedings

Volumn 928, Issue , 2006, Pages 68-73

  Schimpf, Stefan ^a   Schmidt, Bertram ^a  

^a OTTO VON GUERICKE UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOLITHOGRAPHY; PHOTOMASKS; PHOTORESISTORS; PIEZOELECTRIC DEVICES; SILICON WAFERS; SINTERING;

LEAD OXIDES; LOW FIRING TEMPERATURE; PHOTORESIST MASKS;

THICK FILMS;

EID: 33947650221     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0928-gg09-18     Document Type: Conference Paper

References (3)

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2. S. Firebaugh, K.F. Jensen and M.A. Schmidt, J. M.elec.mech. Sys. 7, 128 (1998)
3. R. Maas, M. Koch, N.R. Harris, N.M. White and A.G.R. Evans, Mat. Let. 31, 109 (1997)